2138cn太阳集团(古天乐代言)-The Best website









2015-2019,德国伊尔梅瑙工业大学,研究员 (Scientific Researcher/Wissenschaftliche Mitarbeiter)

2017-2021,德国公司5microns GmbH,项目工程师 (Project Engineer/Projektingenieur)






2018.11-2019.11TU-Ilmenau/Microresist TechnologyDevelopment of New Commercial Nanoimprint Resist

2016.05-2019.04,德国联邦教育与研究部(BMBF)Key Technology Nanointegration Utilized for Spectroscopic Sensor Systems

2014.01-2017.09,欧盟EU FP7-ICTSwIFT – Non-volatile optical Switch combining Integrated Photonics and Fluidics Technologies

2014.10-2017.03,德国联邦教育与研究部(BMBF)1D-based Sensors for Gas and Magnetic Field Measurements

2016.10-2018.03,德国联邦教育与研究部(BMBF)Thermopile Sensor Based on Surface Micromechanics for Pyrometry Applications

2008.05-2013.10,德国联邦教育与研究部(BMBF)Tunable Optical Sensor Array


1. Shuhao Si, C.Weigel, M.Messerschmidt, M.W.Thesen, S.Sinzinger, S.Strehle, “A study of imprint and etching behavior on fused silica of a new tailored resist mr-NIL213FC for Soft UV-NIL”, Micro and Nano Engineering, Vol. 6, 100047, April 2020,

DOI: 10.1016/j.mne.2020.100047

2. Shuhao Si, Martin Hoffmann, “Image inverting, topography and feature size manipulation using organic/inorganic bi-layer lift-off for nanoimprint template”, Microelectronic Engineering, Volume 197, 5 October 2018, Pages 39-44,

DOI: 10.1016/j.mee.2018.05.005

3. Sarah Günther, Shuhao Si, Herbert D’Heer, Dries Van Thourhout, Martin Hoffmann, “FDTS as Dewetting Coating for an Electrowetting Controlled Silicon Photonic Switch”, IEEE Photonics Technology Letters, Volume: 30, Issue: 23, Dec.1, 1 2018,

DOI: 10.1109/LPT.2018.2874351

4. Shuhao Si, Lars Dittrich, Martin Hoffmann, “The NanoTuFe - Fabrication of large area periodic nanopatterns with tunable feature sizes at low cost”, Microelectronic Engineering, Volume 180, 5 August 2017, Pages 71-80,

DOI: 10.1016/j.mee.2017.06.002

5. S. Günther, C. Endrödy; Shuhao Si, S. Weinberger, R. Claes; Y. Justo; H. D'heer; A. Neft; M. Hoffmann, “EWOD system designed for optical switching”, Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS), pp. 1329-1332

DOI: 10.1109/MEMSYS.2017.7863665

6. Shuhao Si, Martin Hoffmann, “Consecutive imprinting performance of large area UV nanoimprint lithography using bi-layer soft stamps in ambient atmosphere”, Microelectronic Engineering, Volume 176, 25 May 2017, Pages 62-70,

DOI: 10.1016/j.mee.2017.01.032

7. Shuhao Si, Lars Dittrich, Martin Hoffmann, “Low-cost fabrication of nanoimprint templates with tunable feature sizes at a constant pitch”, Microelectronic Engineering, Volume 170, 25 February 2017, Pages 34-38,

DOI: 10.1016/j.mee.2016.12.023


Shuhao Si, Sarah Degenhardt, “Active optical switch system with anti-wetting coating”, EP3510431A1, WO2018049399A1, 2018

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